DocumentCode :
1412038
Title :
Packaging Approach for Integrating 40/45-nm ELK Devices Into Wire Bond and Flip-Chip Packages
Author :
Hong, Tan Hua ; Beleran, John ; Drake, Koh Y S ; Wilson, Ong P L ; Mehta, Gaurav ; Librado, Gatbonton ; Zhang, X.R. ; Surasit, C.
Author_Institution :
United Test & Assembly Center Ltd., Singapore, Singapore
Volume :
1
Issue :
12
fYear :
2011
Firstpage :
1923
Lastpage :
1933
Abstract :
There is a rapid transition in the semiconductor packaging industry of devices moving toward 40/45-nm extreme low k (ELK) from the development phase into mainstream semiconductor assembly manufacturing. The drive to achieve adoption without major changes to process and equipment infrastructure while meeting the superior yield necessary is high. The main goal of this paper is to share learning´s and provide solutions for integration and qualifications of 40/45-nm ELK devices into flip-chip (FC) and wire-bond (WB) package technology. The scope of this paper covers the fine-pitch ball grid array for the WB packages and FC chip-scale package for the FC Devices. The main challenge and focus point for WB 45/40-nm interconnects is on the first bond process. This paper will share some detailed analysis on the following. 1) Characterization for 45 nm ELK ultrafine-pitch. 2) Key factors for good Au ball bond integrity. 3) Recommendations for achieving the required levels of reliability for 45-nm Cu ELK. The challenge of FC Technology today has been changing at a faster rate and more and more adoption has been made from the conventional eutectic solder bumps or high lead solder bumps toward the lead free solder bump mainly due to the Green initiatives. This paper will share analysis on the following areas. 1) Thermo-mechanical simulation on key input factors and its correlation to actual evaluations. 2) Integration of Pb Free ELK bumps with 40-nm ELK technology are various critical processes. 3) Moldable underfill technology for Pb Free + ELK devices. In addition, critical process control is also required at the wafer level process of wafer thinning and dicing, including the need of Laser Grooving will also be covered.
Keywords :
assembling; ball grid arrays; fine-pitch technology; flip-chip devices; lead bonding; process control; semiconductor device manufacture; semiconductor device packaging; semiconductor device reliability; solders; wafer level packaging; ELK device; FC-scale package technology; WB chip-scale package technology; ball bond integrity; bonding process; eutectic solder bump; extreme low k device; fine-pitch ball grid array; flip-chip-scale packaging technology; laser grooving; lead free solder bump; moldable underfill technology; process control; semiconductor assembly manufacturing; semiconductor devices packaging industry; size 40 nm; size 45 nm; thermomechanical simulation; wafer dicing; wafer level processing; wafer thinning; wire bond chip-scale packaging technology; Assembly; Gold; Laser beam cutting; Stress; Substrates; Wires; 40 nm; extreme low k; flip chip; moldable underfill; white bump;
fLanguage :
English
Journal_Title :
Components, Packaging and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
2156-3950
Type :
jour
DOI :
10.1109/TCPMT.2011.2158106
Filename :
6119124
Link To Document :
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