Preferred crystal orientation of NiFe underlayers and its effect on magnetostriction of Co/Cu/Co thin films

Author

Yeh, T. ; Sivertsen, J.M. ; Lin, C.L.

Author_Institution

Solid State Electron. Center, Honeywell Inc., Plymouth, MN, USA

Volume

34

Issue

4

fYear

1998

fDate

7/1/1998 12:00:00 AM

Firstpage

870

Lastpage

872

Abstract

The saturation magnetostriction of sputtered Co/Cu/Co thin films affected by preferred crystal orientation distribution of NiFe underlayers has been investigated. The experimental results indicated that preferred crystal orientation of NiFe underlayers plays a significant role in affecting the magnetoelastic behavior of coupled Co films separated by a thin Cu film. Negative value of saturation magnetostriction (-4.9×10^-6) was obtained on sample film deposited on the NiFe underlayer with a more random crystal orientation distribution, while positive value of saturation magnetostriction (+11.6×10^-6) was found on sample film deposited on highly [111] oriented NiFe film. It is clear that the preferred crystal orientation distribution of NiFe underlayers has a marked effect on the saturation magnetostriction of Co/Cu/Co films that λ_s is very sensitive to film structure and crystalline orientation texture

Keywords

cobalt; copper; crystal orientation; iron alloys; magnetic multilayers; magnetic thin films; magnetoelastic effects; magnetostriction; nickel alloys; sputtered coatings; texture; Co-Cu-Co; Co/Cu/Co thin films; NiFe; NiFe underlayers; crystalline orientation texture; film structure; magnetoelastic behavior; preferred crystal orientation; saturation magnetostriction; sputtered films; Crystallization; Magnetic anisotropy; Magnetic films; Magnetic multilayers; Magnetic separation; Magnetostriction; Perpendicular magnetic anisotropy; Residual stresses; Saturation magnetization; Sputtering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.706295

Filename

706295