DocumentCode
1412488
Title
Process monitoring of spin-valve GMR deposition
Author
Kools, J.C.S. ; Paranjpe, A.P. ; Schwartz, P.V. ; Bubber, R. ; Bergner, B. ; Kula, W. ; Rijks, Th.G.S.M.
Author_Institution
CVC, Fremont, CA, USA
Volume
34
Issue
4
fYear
1998
fDate
7/1/1998 12:00:00 AM
Firstpage
945
Lastpage
947
Abstract
A phenomenological description of the conductance of a spin-valve structure is developed and compared to numerical solutions for the Boltzmann equation. Based on the phenomenological description, a method is presented to measure the controllability of physical vapor deposition of sub-100 Å Cu films with better than 0.5 Å accuracy
Keywords
Boltzmann equation; Permalloy; copper; giant magnetoresistance; magnetic multilayers; vapour deposition; Boltzmann equation; Cu-NiFe; giant magnetoresistance; phenomenological description; physical vapor deposition; spin-valve structure; Antiferromagnetic materials; Automatic control; Conductivity; Controllability; Electrons; Magnetic heads; Magnetic materials; Measurement standards; Monitoring; Nonhomogeneous media;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.706322
Filename
706322
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