Title :
Fabrication of large area nanostructured magnets by interferometric lithography
Author :
Farhoud, M. ; Hwang, M. ; Smith, Henry I. ; Schattenburg, M.L. ; Bae, J.M. ; Youcef-Toumi, K. ; Ross, C.A.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., MIT, Cambridge, MA, USA
fDate :
7/1/1998 12:00:00 AM
Abstract :
Patterned arrays of magnetic elements may be useful as media for high density magnetic storage applications. Interferometric lithography has been used to fabricate arrays of cobalt and nickel pillars with periods of 200 nm over areas of 5 cm×5 cm using a UV laser. This provides an economical and rapid method for manufacturing particle arrays
Keywords :
cobalt; ferromagnetic materials; magnetic particles; magnetic storage; magnetic thin films; nanostructured materials; nickel; photolithography; 200 nm; 5 cm; Co-Ni; interferometric lithography; large area nanostructured magnets; patterned arrays; Fabrication; Interference; Interferometric lithography; Magnetic particles; Magnets; Materials science and technology; Nickel; Optical arrays; Resists; Space technology;
Journal_Title :
Magnetics, IEEE Transactions on
