DocumentCode
1412783
Title
Fabrication of large area nanostructured magnets by interferometric lithography
Author
Farhoud, M. ; Hwang, M. ; Smith, Henry I. ; Schattenburg, M.L. ; Bae, J.M. ; Youcef-Toumi, K. ; Ross, C.A.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., MIT, Cambridge, MA, USA
Volume
34
Issue
4
fYear
1998
fDate
7/1/1998 12:00:00 AM
Firstpage
1087
Lastpage
1089
Abstract
Patterned arrays of magnetic elements may be useful as media for high density magnetic storage applications. Interferometric lithography has been used to fabricate arrays of cobalt and nickel pillars with periods of 200 nm over areas of 5 cm×5 cm using a UV laser. This provides an economical and rapid method for manufacturing particle arrays
Keywords
cobalt; ferromagnetic materials; magnetic particles; magnetic storage; magnetic thin films; nanostructured materials; nickel; photolithography; 200 nm; 5 cm; Co-Ni; interferometric lithography; large area nanostructured magnets; patterned arrays; Fabrication; Interference; Interferometric lithography; Magnetic particles; Magnets; Materials science and technology; Nickel; Optical arrays; Resists; Space technology;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.706365
Filename
706365
Link To Document