DocumentCode :
1413403
Title :
Single-Event Transient Measurements in nMOS and pMOS Transistors in a 65-nm Bulk CMOS Technology at Elevated Temperatures
Author :
Gadlage, Matthew J. ; Ahlbin, Jonathan R. ; Narasimham, Balaji ; Bhuva, Bharat L. ; Massengill, Lloyd W. ; Schrimpf, Ronald D.
Author_Institution :
NAVSEA Crane, Crane, IN, USA
Volume :
11
Issue :
1
fYear :
2011
fDate :
3/1/2011 12:00:00 AM
Firstpage :
179
Lastpage :
186
Abstract :
In this paper, heavy-ion-induced single-event transient (SET) pulsewidths measured in a 65-nm bulk CMOS technology at temperatures ranging from 25°C to 100°C with an autonomous SET capture circuit are presented. The experimental results for the SETs induced in two different inverter chain circuits indicate an increase in the average SET pulsewidth as a function of the operating temperature. Unique SET test structures were also designed to differentiate between SETs induced in an nMOS transistor and those induced in a pMOS transistor. The SET widths induced in a pMOS transistor increase more with temperature than the SETs induced in an nMOS transistor.
Keywords :
CMOS integrated circuits; MOSFET; invertors; autonomous SET capture circuit; bulk CMOS technology; heavy-ion-induced SET pulsewidths; inverter chain circuits; nMOS transistors; pMOS transistors; single-event transient measurements; size 65 nm; temperature 25 degC to 100 degC; Pulsewidth; radiation environment; single event; single-event transient (SET); soft error; soft error rate (SER); temperature;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2010.2102354
Filename :
5676187
Link To Document :
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