Title :
A Simple Test Structure for Evaluating the Variability in Key Characteristics of a Large Number of MOSFETs
Author :
Watabe, Shunichi ; Teramoto, Akinobu ; Abe, Kenichi ; Fujisawa, Takafumi ; Miyamoto, Naoto ; Sugawa, Shigetoshi ; Ohmi, Tadahiro
Author_Institution :
Grad. Sch. of Eng., Tohoku Univ., Sendai, Japan
fDate :
5/1/2012 12:00:00 AM
Abstract :
The increase in the electrical characteristic variability of MOSFETs caused by the miniaturization of MOSFETs is one of the critical issues for realizing the low power consumption of large-scale-integrated circuits and the high accuracy of analog devices. It is necessary to easily evaluate the variability of a very large number of MOSFETs in a very short time for short-period-developing fabrication processes and device structures. We have proposed and developed a simple test structure for evaluating the electrical characteristics of over 1.2 million MOSFETs such as threshold voltage (Vth), subthreshold swing (S-factor) in around 30 min. The accuracy of the test circuit developed is 1.9 mV, as 3σ. We have also evaluated the Vth distribution, the S-factor distribution, and the dependence of Vth variability on the gate size and antenna ratio of MOSFETs. The measurement results are very useful in developing fabrication processes, process equipment, and device structures, that suppress the variability.
Keywords :
MOSFET; large scale integration; low-power electronics; semiconductor device testing; MOSFET; S-factor distribution; analog devices; antenna ratio; electrical characteristic variability evaluation; gate size; large scale integrated circuits; low power consumption; metal oxide silicon field effect transistors; process equipment; short-period-developing fabrication processes; subthreshold swing; test circuit; test structure; threshold voltage; Current measurement; Logic gates; MOSFETs; Threshold voltage; Voltage measurement; Fluctuation; MOSFET; statistical evaluation; test structure; variability; variation;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2011.2181667