High wear durability of ECR-sputtered carbon films

Author

Hirono, S. ; Umemura, S. ; Andoh, Y. ; Hayashi, T. ; Kaneko, R.

Author_Institution

NTT Integrated Inf. & Energy Syst. Labs., Tokyo, Japan

Volume

34

Issue

4

fYear

1998

fDate

7/1/1998 12:00:00 AM

Firstpage

1729

Lastpage

1731

Abstract

We investigated the effect of ion irradiation on the wear of carbon films prepared by electron-cyclotron-resonance plasma (ECR) sputtering. The wear durability of the ECR-sputtered films was far superior to that of the RF-sputtered films. ECR-sputtered films made with a high energy ion irradiation showed the highest irradiation wear resistance, nearly equal to that of bulk diamond. We attribute this high durability to selective etching of the weakly bonded carbon atoms by the high-energy ion irradiation

Keywords

carbon; magnetic recording; sputter deposition; sputter etching; wear resistant coatings; C; ECR-sputtered carbon films; electron-cyclotron-resonance plasma sputtering; high energy ion irradiation; high wear durability; high-energy ion irradiation; ion irradiation; irradiation wear resistance; magnetic recording; selective etching; weakly bonded carbon atoms; wear; Acceleration; Atomic layer deposition; Current density; Magnetic films; Optical films; Plasma applications; Radio frequency; Sputtering; Substrates; Voltage;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.706686

Filename

706686