DocumentCode :
1415136
Title :
Monolithic integration of AlGaN/GaN HFET with MOS on silicon (111) substrates
Author :
Chyurlia, P.N. ; Semond, F. ; Lester, T. ; Bardwell, J.A. ; Rolfe, S. ; Tang, Hongying ; Tarr, N.G.
Author_Institution :
Dept. of Electron., Carleton Univ., Ottawa, ON, Canada
Volume :
46
Issue :
3
fYear :
2010
Firstpage :
253
Lastpage :
254
Abstract :
AlGaN/GaN HFETs and silicon MOSFETs have been integrated monolithically on a silicon (111) substrate. A differential heteroepitaxy technique was used to grow AlGaN/GaN HFET layers on silicon (111) substrates while leaving protected areas of atomically smooth silicon in which MOSFETs are built.
Keywords :
III-V semiconductors; MOSFET; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor growth; substrates; wide band gap semiconductors; AlGaN-GaN; HFET; MOS; differential heteroepitaxy technique; monolithic integration; silicon substrates;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2010.3167
Filename :
5410678
Link To Document :
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