Title :
Fabrication of a fiber probe with a nanometric protrusion for near-field optical microscopy by a novel technique of three-dimensional nanophotolithography
Author :
Matsumoto, Takuya ; Ohtsu, Motoichi
Author_Institution :
Interdisciplinary Graduate Sh. of Sci. & Eng., Tokyo Inst. of Technol., Japan
fDate :
10/1/1996 12:00:00 AM
Abstract :
A new technique based on photolithography has been developed to fabricate a fiber probe with a nanometric protruding tip for near field optical microscopy. As a first step, an optical fiber is sharpened by chemical etching and coated with metallic film. Next, it is coated with photoresist and its apex region is selectively exposed to an evanescent wave. Finally, the metallic film at the apex region is etched away. The foot diameter of the protrusion fabricated by this method is about 30 nm
Keywords :
etching; fibre optic sensors; metallic thin films; nanotechnology; optical microscopy; photolithography; photoresists; 30 nm; apex region; chemical etching; evanescent wave; fiber probe fabrication; fibre optic sensor fabrication; foot diameter; metallic film coated; nanometric protruding tip; nanometric protrusion; near field optical microscopy; near-field optical microscopy; photolithography; photoresist; three-dimensional nanophotolithography; Chemicals; Etching; Lithography; Optical device fabrication; Optical fibers; Optical films; Optical microscopy; Optical surface waves; Probes; Resists;
Journal_Title :
Lightwave Technology, Journal of
