• DocumentCode
    1417788
  • Title

    In the flow with MEMS

  • Author

    Rasmussen, Angela ; Zaghloul, Mona E.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., George Washington Univ., Washington, DC, USA
  • Volume
    14
  • Issue
    4
  • fYear
    1998
  • fDate
    7/1/1998 12:00:00 AM
  • Firstpage
    12
  • Lastpage
    25
  • Abstract
    Presents an overview of MEMS technology where we look at the different micromachining techniques and the CMOS fabrication process. Next we provide general information about flow sensors, including common applications. We will then analyze the structures used for MEMS flow sensors along with their associated CMOS circuits which can integrate the flow sensor into a smart flow-sensor system
  • Keywords
    CMOS analogue integrated circuits; flow measurement; intelligent sensors; micromachining; microsensors; CMOS fabrication process; MEMS technology; flow sensors; micromachining techniques; smart sensor system; Anisotropic magnetoresistance; Circuits; Dry etching; Micromachining; Micromechanical devices; Silicon; Substrates; Thin film sensors; Transistors; Wet etching;
  • fLanguage
    English
  • Journal_Title
    Circuits and Devices Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    8755-3996
  • Type

    jour

  • DOI
    10.1109/101.708474
  • Filename
    708474
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1417788