DocumentCode :
1417901
Title :
Modeling effects of electron-velocity overshoot in a MOSFET
Author :
Roldán, J.B. ; Gámiz, F. ; López-Villanueva, J.A. ; Carceller, J.E.
Author_Institution :
Dept. de Electron. y Tecnologia de Computadores, Granada Univ., Spain
Volume :
44
Issue :
5
fYear :
1997
fDate :
5/1/1997 12:00:00 AM
Firstpage :
841
Lastpage :
846
Abstract :
A simple analytical expression to account for electron-velocity overshoot effects on the performance of very short-channel MOSFETs has been obtained. This new model can be easily included in circuit simulators of systems with a huge number of components. The influence of temperature and low-field mobility on the increase of MOSFET transconductance produced by electron-velocity overshoot as channel lengths are reduced can be easily taken into account in our model. The accuracy of this model has been verified by reproducing experimental and simulated data reported by other authors
Keywords :
MOSFET; electric admittance; electron mobility; semiconductor device models; MOSFET transconductance increase; analytical expression; channel length reduction; circuit simulators; electron-velocity overshoot effects; low-field mobility; modeling; temperature effect; very short-channel MOSFET; Analytical models; Circuit simulation; Computational modeling; Computer simulation; Electrons; Lattices; MOSFET circuits; Performance analysis; Predictive models; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.568047
Filename :
568047
Link To Document :
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