DocumentCode :
1418109
Title :
Temperature Dependence of Drain Current Mismatch in Nanoscale Uniaxial-Strained PMOSFETs
Author :
Kuo, Jack J Y ; Chen, William P N ; Su, Pin
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
32
Issue :
3
fYear :
2011
fDate :
3/1/2011 12:00:00 AM
Firstpage :
240
Lastpage :
242
Abstract :
This letter reports new findings on the temperature dependence of mismatching properties in nanoscale uniaxial-strained pMOSFETs. Our results reveal that the temperature dependence of drain current mismatch can be modulated by uniaxial strain. In the high gate-voltage overdrive linear region, the compressively strained device shows smaller increment in drain current mismatch than the unstrained counterpart as temperature decreases. In the high saturation region, opposite to the unstrained case, the drain current mismatch of the compressively strained device decreases with temperature. The underlying mechanism is the larger temperature sensitivity of carrier mobility for the strained device.
Keywords :
MOSFET; carrier mobility; nanoelectronics; carrier mobility; compressively strained device; drain current mismatch; gate-voltage overdrive linear region; nanoscale uniaxial-strained PMOSFET; uniaxial strain; Mismatch; temperature dependence; uniaxial-strained silicon; variation;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2095818
Filename :
5680576
Link To Document :
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