• DocumentCode
    1418109
  • Title

    Temperature Dependence of Drain Current Mismatch in Nanoscale Uniaxial-Strained PMOSFETs

  • Author

    Kuo, Jack J Y ; Chen, William P N ; Su, Pin

  • Author_Institution
    Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • Volume
    32
  • Issue
    3
  • fYear
    2011
  • fDate
    3/1/2011 12:00:00 AM
  • Firstpage
    240
  • Lastpage
    242
  • Abstract
    This letter reports new findings on the temperature dependence of mismatching properties in nanoscale uniaxial-strained pMOSFETs. Our results reveal that the temperature dependence of drain current mismatch can be modulated by uniaxial strain. In the high gate-voltage overdrive linear region, the compressively strained device shows smaller increment in drain current mismatch than the unstrained counterpart as temperature decreases. In the high saturation region, opposite to the unstrained case, the drain current mismatch of the compressively strained device decreases with temperature. The underlying mechanism is the larger temperature sensitivity of carrier mobility for the strained device.
  • Keywords
    MOSFET; carrier mobility; nanoelectronics; carrier mobility; compressively strained device; drain current mismatch; gate-voltage overdrive linear region; nanoscale uniaxial-strained PMOSFET; uniaxial strain; Mismatch; temperature dependence; uniaxial-strained silicon; variation;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2010.2095818
  • Filename
    5680576