DocumentCode
1418109
Title
Temperature Dependence of Drain Current Mismatch in Nanoscale Uniaxial-Strained PMOSFETs
Author
Kuo, Jack J Y ; Chen, William P N ; Su, Pin
Author_Institution
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume
32
Issue
3
fYear
2011
fDate
3/1/2011 12:00:00 AM
Firstpage
240
Lastpage
242
Abstract
This letter reports new findings on the temperature dependence of mismatching properties in nanoscale uniaxial-strained pMOSFETs. Our results reveal that the temperature dependence of drain current mismatch can be modulated by uniaxial strain. In the high gate-voltage overdrive linear region, the compressively strained device shows smaller increment in drain current mismatch than the unstrained counterpart as temperature decreases. In the high saturation region, opposite to the unstrained case, the drain current mismatch of the compressively strained device decreases with temperature. The underlying mechanism is the larger temperature sensitivity of carrier mobility for the strained device.
Keywords
MOSFET; carrier mobility; nanoelectronics; carrier mobility; compressively strained device; drain current mismatch; gate-voltage overdrive linear region; nanoscale uniaxial-strained PMOSFET; uniaxial strain; Mismatch; temperature dependence; uniaxial-strained silicon; variation;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2010.2095818
Filename
5680576
Link To Document