Title :
Technology-design-manufacturing co-optimization for advanced mobile SoCs
Author_Institution :
Qualcomm Technologies Inc., 5775 Morehouse Drive, San Diego, CA 92121
Abstract :
How to maintain the Moore´s Law scaling beyond the 193 immersion resolution limit is the key question semiconductor industry needs to answer in the near future. Process complexity will undoubtfully increase for 14nm node and beyond, which brings both challenges and opportunities for technology development. A vertically integrated technology-design-manufacturing co-optimization flow is desired to better address the complicated issues new process changes bring. In recent years smart mobile wireless devices have been the fastest growing consumer electronics market. Advanced mobile devices such as smartphones are complex systems with the overriding objective of providing the best user-experience value by harnessing all the technology innovations. Most critical system drivers are better system performance/power efficiency, cost effectiveness, and smaller form factors, which, in turns, drive the need of system design and solution with More-than-Moore innovations. Mobile system-on-chips (SoCs) has become the leading driver for semiconductor technology definition and manufacturing. Here we highlight how the co-optimization strategy influenced architecture, device/circuit, process technology and package, in the face of growing process cost/complexity and variability as well as design rule restrictions.
Keywords :
Logic gates; Metals; Mobile communication; Optimization; Performance evaluation; Standards; System-on-chip; Mobile SoCs; design rule; design-technology co-optimization; double patterning; local interconnect;
Conference_Titel :
Custom Integrated Circuits Conference (CICC), 2014 IEEE Proceedings of the
Conference_Location :
San Jose, CA, USA
DOI :
10.1109/CICC.2014.6946000