DocumentCode :
1419607
Title :
Quantitative characterization of proton-exchanged layers in LiTaO3 optoelectronic devices by line-focus-beam acoustic microscopy
Author :
Kushibiki, J. ; Miyashita, M. ; Chubachi, N.
Author_Institution :
Dept. of Electr. Eng., Tohoku Univ., Sendai, Japan
Volume :
8
Issue :
11
fYear :
1996
Firstpage :
1516
Lastpage :
1518
Abstract :
Application of line-focus-beam (LFB) acoustic microscopy is extended to quantitative characterization of proton-exchanged/annealed layers employed in LiTaO/sub 3/ optical waveguides. Several specimens of Z-cut LiTaO/sub 3/ substrates, processed under the fabrication conditions for second-harmonic generation (SHG) optoelectronic devices, were prepared for measurements of the leaky surface acoustic wave (LSAW) velocities. Remarkable decreases in LSAW velocity due to the processes of proton exchange and annealing were observed, providing very useful information on the proton concentration and depth in diffusion layer, and on the process temperature distribution. It is found that measurement sensitivity is highest in the Y-axis wave propagation direction and the resolution to the optical waveguide parameters of diffusion depth and refractive index is much greater than the conventional techniques. It is suggested that this ultrasonic method should be adopted as a new analytical technique for development and evaluation of device fabrication processes and systems destined for future mass production.
Keywords :
acoustic focusing; acoustic microscopy; annealing; integrated optics; ion exchange; lithium compounds; optical films; optical testing; optical waveguides; optoelectronic devices; substrates; LiTaO/sub 3/; LiTaO/sub 3/ optical waveguides; LiTaO/sub 3/ optoelectronic devices; SHG optoelectronic devices; Y-axis wave propagation direction; Z-cut LiTaO/sub 3/ substrates; annealed layers; device fabrication; diffusion depth; diffusion layer; leaky surface acoustic wave; line-focus-beam acoustic microscopy; mass production; measurement sensitivity; optical waveguide parameters; process temperature distribution; proton concentration; proton-exchanged layers; quantitative characterization; refractive index; resolution; second-harmonic generation; ultrasonic method; Acoustic measurements; Acoustic waves; Annealing; Optical device fabrication; Optical harmonic generation; Optical microscopy; Optical refraction; Optical sensors; Optical variables control; Optical waveguides;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.541568
Filename :
541568
Link To Document :
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