DocumentCode
1419607
Title
Quantitative characterization of proton-exchanged layers in LiTaO3 optoelectronic devices by line-focus-beam acoustic microscopy
Author
Kushibiki, J. ; Miyashita, M. ; Chubachi, N.
Author_Institution
Dept. of Electr. Eng., Tohoku Univ., Sendai, Japan
Volume
8
Issue
11
fYear
1996
Firstpage
1516
Lastpage
1518
Abstract
Application of line-focus-beam (LFB) acoustic microscopy is extended to quantitative characterization of proton-exchanged/annealed layers employed in LiTaO/sub 3/ optical waveguides. Several specimens of Z-cut LiTaO/sub 3/ substrates, processed under the fabrication conditions for second-harmonic generation (SHG) optoelectronic devices, were prepared for measurements of the leaky surface acoustic wave (LSAW) velocities. Remarkable decreases in LSAW velocity due to the processes of proton exchange and annealing were observed, providing very useful information on the proton concentration and depth in diffusion layer, and on the process temperature distribution. It is found that measurement sensitivity is highest in the Y-axis wave propagation direction and the resolution to the optical waveguide parameters of diffusion depth and refractive index is much greater than the conventional techniques. It is suggested that this ultrasonic method should be adopted as a new analytical technique for development and evaluation of device fabrication processes and systems destined for future mass production.
Keywords
acoustic focusing; acoustic microscopy; annealing; integrated optics; ion exchange; lithium compounds; optical films; optical testing; optical waveguides; optoelectronic devices; substrates; LiTaO/sub 3/; LiTaO/sub 3/ optical waveguides; LiTaO/sub 3/ optoelectronic devices; SHG optoelectronic devices; Y-axis wave propagation direction; Z-cut LiTaO/sub 3/ substrates; annealed layers; device fabrication; diffusion depth; diffusion layer; leaky surface acoustic wave; line-focus-beam acoustic microscopy; mass production; measurement sensitivity; optical waveguide parameters; process temperature distribution; proton concentration; proton-exchanged layers; quantitative characterization; refractive index; resolution; second-harmonic generation; ultrasonic method; Acoustic measurements; Acoustic waves; Annealing; Optical device fabrication; Optical harmonic generation; Optical microscopy; Optical refraction; Optical sensors; Optical variables control; Optical waveguides;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.541568
Filename
541568
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