• DocumentCode
    1419607
  • Title

    Quantitative characterization of proton-exchanged layers in LiTaO3 optoelectronic devices by line-focus-beam acoustic microscopy

  • Author

    Kushibiki, J. ; Miyashita, M. ; Chubachi, N.

  • Author_Institution
    Dept. of Electr. Eng., Tohoku Univ., Sendai, Japan
  • Volume
    8
  • Issue
    11
  • fYear
    1996
  • Firstpage
    1516
  • Lastpage
    1518
  • Abstract
    Application of line-focus-beam (LFB) acoustic microscopy is extended to quantitative characterization of proton-exchanged/annealed layers employed in LiTaO/sub 3/ optical waveguides. Several specimens of Z-cut LiTaO/sub 3/ substrates, processed under the fabrication conditions for second-harmonic generation (SHG) optoelectronic devices, were prepared for measurements of the leaky surface acoustic wave (LSAW) velocities. Remarkable decreases in LSAW velocity due to the processes of proton exchange and annealing were observed, providing very useful information on the proton concentration and depth in diffusion layer, and on the process temperature distribution. It is found that measurement sensitivity is highest in the Y-axis wave propagation direction and the resolution to the optical waveguide parameters of diffusion depth and refractive index is much greater than the conventional techniques. It is suggested that this ultrasonic method should be adopted as a new analytical technique for development and evaluation of device fabrication processes and systems destined for future mass production.
  • Keywords
    acoustic focusing; acoustic microscopy; annealing; integrated optics; ion exchange; lithium compounds; optical films; optical testing; optical waveguides; optoelectronic devices; substrates; LiTaO/sub 3/; LiTaO/sub 3/ optical waveguides; LiTaO/sub 3/ optoelectronic devices; SHG optoelectronic devices; Y-axis wave propagation direction; Z-cut LiTaO/sub 3/ substrates; annealed layers; device fabrication; diffusion depth; diffusion layer; leaky surface acoustic wave; line-focus-beam acoustic microscopy; mass production; measurement sensitivity; optical waveguide parameters; process temperature distribution; proton concentration; proton-exchanged layers; quantitative characterization; refractive index; resolution; second-harmonic generation; ultrasonic method; Acoustic measurements; Acoustic waves; Annealing; Optical device fabrication; Optical harmonic generation; Optical microscopy; Optical refraction; Optical sensors; Optical variables control; Optical waveguides;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.541568
  • Filename
    541568