DocumentCode
1419785
Title
Silicide application on gated single-crystal, polycrystalline and amorphous silicon FEAs. II. Co silicide
Author
Lee, Jong Duk ; Shim, Byung Chang ; Park, Byung-Gook
Author_Institution
Sch. of Electr. Eng., Seoul Nat. Univ., South Korea
Volume
48
Issue
1
fYear
2001
fDate
1/1/2001 12:00:00 AM
Firstpage
155
Lastpage
160
Abstract
For pt. I see ibid., vol.48, no.1, p.149-54 (Jan. 2001). For enhancement and stabilization of electron emission, Co silicides were formed from Co, Co/Ti and Ti/Co layers on silicon FEAs. Since Ti prevents oxygen adsorption on the Co film during silicidation, uniform and smooth Co silicide layers can be obtained by depositing Co first and then Ti on silicon tips, followed by rapid annealing. Among Co silicide FEAs, Co silicide formed from Ti/Co bi-layers shows the lowest leakage current, the highest failure voltage over 152 V and the largest anode current over 1 mA at the gate voltage of 150 V. Compared with silicon field emitters, the silicide FEAs formed from Ti/Co layers exhibited a significant improvement in maximum emission current, emission current fluctuation and stability, and failure voltage
Keywords
cobalt compounds; current fluctuations; electron field emission; elemental semiconductors; leakage currents; rapid thermal annealing; silicon; vacuum microelectronics; 1 mA; 150 V; 152 V; Co layers; Co silicides; Co/Ti bilayers; CoSi; O2 adsorption prevention; Si; Si-Co; Si-Co-Ti; Ti/Co bilayers; amorphous silicon FEAs; anode current; electron emission enhancement; electron emission stabilization; emission current fluctuation; failure voltage; gate voltage; leakage current; maximum emission current; polycrystalline silicon FEAs; rapid annealing; silicidation; silicide FEAs; single-crystal silicon FEAs; Annealing; Anodes; Electron emission; Fluctuations; Leakage current; Semiconductor films; Silicidation; Silicides; Silicon; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.892183
Filename
892183
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