• DocumentCode
    1420018
  • Title

    DC and RF characteristics of doped multichannel AlAs/sub 0.56/Sb/sub 0.44//In/sub 0.53/Ga/sub 0.47/As field effect transistors with variable gate-lengths

  • Author

    Dumka, D.C. ; Cueva, G. ; Hier, H. ; Aina, O.A. ; Adesida, I.

  • Author_Institution
    Microelectron. Lab., Illinois Univ., Urbana, IL, USA
  • Volume
    22
  • Issue
    1
  • fYear
    2001
  • Firstpage
    5
  • Lastpage
    7
  • Abstract
    Depletion-mode doped-channel field effect transistors (DCFETs) using a AlAs/sub 0.56/Sb/sub 0.44//In/sub 0.53/Ga/sub 0.47/As heterostructure with multiple channels grown by molecular beam epitaxy (MBE) on an InP substrate are presented. Devices with gate lengths ranging from 0.2 μm to 1.0 μm have been fabricated. Three doped In/sub 0.53/Ga/sub 0.47/As channels separated by undoped AlAs/sub 0.56/Sb/sub 0.44/ layers are used for the devices. The devices exhibit unity current gain cut-off frequencies typically between 18 GHz and 73 GHz and corresponding maximum oscillation frequencies typically between 60 GHz and 160 GHz. The multiple channel approach results in wide linearity of dc and RF performance of the device.
  • Keywords
    III-V semiconductors; aluminium compounds; field effect transistors; gallium arsenide; indium compounds; semiconductor epitaxial layers; 0.2 to 1.0 mum; AlAs/sub 0.56/Sb/sub 0.44/-In/sub 0.53/Ga/sub 0.47/As; DC characteristics; InP; InP substrate; MBE; RF characteristics; current gain cut-off frequencies; doped multichannel FET; gate-length; Conducting materials; Cutoff frequency; FETs; HEMTs; Indium gallium arsenide; Indium phosphide; Linearity; Molecular beam epitaxial growth; Radio frequency; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.892426
  • Filename
    892426