DocumentCode
1420018
Title
DC and RF characteristics of doped multichannel AlAs/sub 0.56/Sb/sub 0.44//In/sub 0.53/Ga/sub 0.47/As field effect transistors with variable gate-lengths
Author
Dumka, D.C. ; Cueva, G. ; Hier, H. ; Aina, O.A. ; Adesida, I.
Author_Institution
Microelectron. Lab., Illinois Univ., Urbana, IL, USA
Volume
22
Issue
1
fYear
2001
Firstpage
5
Lastpage
7
Abstract
Depletion-mode doped-channel field effect transistors (DCFETs) using a AlAs/sub 0.56/Sb/sub 0.44//In/sub 0.53/Ga/sub 0.47/As heterostructure with multiple channels grown by molecular beam epitaxy (MBE) on an InP substrate are presented. Devices with gate lengths ranging from 0.2 μm to 1.0 μm have been fabricated. Three doped In/sub 0.53/Ga/sub 0.47/As channels separated by undoped AlAs/sub 0.56/Sb/sub 0.44/ layers are used for the devices. The devices exhibit unity current gain cut-off frequencies typically between 18 GHz and 73 GHz and corresponding maximum oscillation frequencies typically between 60 GHz and 160 GHz. The multiple channel approach results in wide linearity of dc and RF performance of the device.
Keywords
III-V semiconductors; aluminium compounds; field effect transistors; gallium arsenide; indium compounds; semiconductor epitaxial layers; 0.2 to 1.0 mum; AlAs/sub 0.56/Sb/sub 0.44/-In/sub 0.53/Ga/sub 0.47/As; DC characteristics; InP; InP substrate; MBE; RF characteristics; current gain cut-off frequencies; doped multichannel FET; gate-length; Conducting materials; Cutoff frequency; FETs; HEMTs; Indium gallium arsenide; Indium phosphide; Linearity; Molecular beam epitaxial growth; Radio frequency; Substrates;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.892426
Filename
892426
Link To Document