• DocumentCode
    1420199
  • Title

    Capacitance engineering for InP-based heterostructure barrier varactor

  • Author

    Lheurette, E. ; Mélique, X. ; Mounaix, P. ; Mollot, F. ; Vanbésien, O. ; Lippens, D.

  • Author_Institution
    Inst. d´´Electron. et de Microelectron. du Nord, Univ. des Sci. et Tech. de Lille Flandres Artois, Villeneuve d´´Ascq, France
  • Volume
    19
  • Issue
    9
  • fYear
    1998
  • Firstpage
    338
  • Lastpage
    340
  • Abstract
    We investigate new schemes of InP-based heterostructure barrier varactors with the aim of enhancing the capacitance nonlinearity of the devices. Starting from a generic step-like InGaAs/InAlAs/AlAs single barrier heterostructure, planar-doped and buried InAs quantum-well barrier heterostructures were successfully fabricated. It is shown that both solutions lead to more efficient screening of electric field near equilibrium and hence to improvement in the capacitance-voltage ratios with values as high as /spl sim/7:1. Under bias, the capacitance modulation is governed by an escaping mechanism in contrast to the conventional depletion operation mode observed for conventional varactors.
  • Keywords
    III-V semiconductors; UHF diodes; capacitance; indium compounds; semiconductor heterojunctions; semiconductor quantum wells; varactors; 500 MHz; InAs; InGaAs-InAlAs-AlAs; InP; InP-based heterostructure barrier varactor; buried InAs QW barrier heterostructures; capacitance engineering; capacitance modulation; capacitance nonlinearity enhancement; capacitance-voltage ratios; electric field screening; escaping mechanism; planar-doped heterostructures; Capacitance; Doping; Fabrication; Indium compounds; Indium gallium arsenide; Leakage current; Linearity; Quantum well devices; Threshold voltage; Varactors;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.709634
  • Filename
    709634