Title :
Design technology co-optimization for 10 nm and beyond
Author :
Kikkawa, Takamaro ; Joshi, Rajiv
Author_Institution :
Hiroshima University
Abstract :
Silicon-based integrated circuits technologies have reached the extreme level to satisfy the demand of the present society. This requires design technology co-optimization and introduction of new semiconductor materials. The three papers in this session address various facets of technologies for 10 nm and beyond.
Keywords :
CNTFETs; Educational institutions; Integrated circuit technology; Integrated circuits; Photonic band gap; Semiconductor materials; Silicon carbide;
Conference_Titel :
Custom Integrated Circuits Conference (CICC), 2014 IEEE Proceedings of the
Conference_Location :
San Jose, CA, USA
DOI :
10.1109/CICC.2014.6946105
