DocumentCode
1420457
Title
Debye Length and Active Layer Thickness-Dependent Performance Variations of Amorphous Oxide-Based TFTs
Author
Jeong, Jaewook ; Hong, Yongtaek
Author_Institution
Div. of Nano & Bio Technol., Daegu Gyeongbuk Inst. of Sci. & Technol., Daegu, South Korea
Volume
59
Issue
3
fYear
2012
fDate
3/1/2012 12:00:00 AM
Firstpage
710
Lastpage
714
Abstract
We analyzed the active layer thickness-dependent performance variations of amorphous oxide-based semiconductor thin-film transistors (AOS TFTs), which are typically operated in depletion mode by using an ATLAS 2-D device simulator. The negative shift of threshold voltage was originated from increasing the amount of intrinsic carrier as active layer thickness is increased. On the contrary, off-current level was a function of Debye length, which is in inverse proportion to the square root of carrier density and the amount of valence band deep states, as well as active layer thickness. Therefore, the relation between Debye length and active layer thickness determines the off-current level, which also enables to explain the off-current behavior of AOS TFTs under light illumination.
Keywords
carrier density; semiconductor device models; thin film transistors; ATLAS 2D device simulator; Debye length; active layer thickness; amorphous oxide-based semiconductor thin-film transistors; carrier density; depletion mode; intrinsic carrier; light illumination; negative shift; performance variations; threshold voltage; valence band deep states; Charge carrier density; Educational institutions; Neodymium; Performance evaluation; Thin film transistors; Threshold voltage; Amorphous indium–gallium–zinc–oxide (a-IGZO); off current; oxide based; simulation; thin-film transistor (TFT); threshold voltage shift;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2011.2180908
Filename
6129495
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