Title :
High temperature performance of three-quantum-well vertical-cavity top-emitting lasers
Author :
Tu, L.W. ; Wang, Y.H. ; Schubert, E.F. ; Weir, B.E. ; Zydzik, G.J. ; Cho, A.Y.
Author_Institution :
AT&T Bell Labs., Murray Hill, NJ, USA
Abstract :
Vertical-cavity top-emitting quantum well lasers are grown by molecular beam epitaxy. The active region consists of three 100 AA GaAs quantum wells separated by 80 AA Al0.3Ga0.7As barriers. Continuous wave lasing by current injection is maintained at temperatures up to 80 degrees C. At room temperature, light output power more than 1 mW is obtained, and threshold currents are as low as 2.0 mA for 10 mu m devices. External differential quantum efficiencies are 50% averaged up to 0.4 mW. The single longitudinal and transverse modes are preserved up to approximately 0.8 mW. The temperature dependence of the threshold current gives T0 as high as 330 degrees C.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; laser modes; molecular beam epitaxial growth; semiconductor epitaxial layers; semiconductor junction lasers; semiconductor quantum wells; 10 micron; 100 AA; 2.0 mA; 22 to 80 degC; 330 degC; 80 AA; CW lasing; GaAs-AlGaAs; III-V semiconductors; active region; current injection; external differential quantum efficiency; light output power; longitudinal mode; molecular beam epitaxy; three-quantum-well vertical-cavity top-emitting lasers; threshold currents; transverse modes;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19910288