Adiabatic plasma buncher

Author

Ferrario, M. ; Katsouleas, T.C. ; Serafini, L. ; Zvi, I.B.

Author_Institution

INFN, Frascati, Italy

Volume

28

Issue

4

fYear

2000

fDate

8/1/2000 12:00:00 AM

Firstpage

1152

Lastpage

1158

Abstract

In this paper, we present a new scheme of injection into a plasma accelerator, aimed at producing a high-quality beam while relaxing the demands on the bunch length of the injected beam. The beam dynamics in the injector, consisting of a high-voltage pulsed photodiode, is analyzed and optimized to produce a λ_p/20 long electron bunch at 2.5 MeV. This bunch is injected into a plasma wave in which it compresses down to λ_p/100, while accelerating up to 250 MeV. This simultaneous bunching and acceleration of a high-quality beam requires a proper combination of injection energy and injection phase. Preliminary results from simulations are shown to assess the potentials of the scheme

Keywords

collective accelerators; particle beam bunching; photodiodes; 2.5 MeV; 250 MeV; adiabatic plasma buncher; beam dynamics; bunching; electron bunch; high-quality beam; high-voltage pulsed photodiode; injection energy; injection phase; plasma accelerator; Acceleration; Diodes; Electron beams; Particle beam injection; Particle beams; Photodiodes; Plasma accelerators; Plasma density; Plasma waves; Radio frequency;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.893295

Filename

893295