DocumentCode
142266
Title
The alternative algorithm for the determination of threshold voltages on N-channel Fin-FET devices
Author
Hsin-Chia Yang ; Cheng-Yu Tsai ; Ko-Fan Liao ; Wen-Shang Liao ; Fang Hsu ; Sung-Ching Chi
Author_Institution
Dept. of Electron. Eng., Minghsin Univ. of Sci. & Technol., Hsinchu, Taiwan
Volume
3
fYear
2014
fDate
26-28 April 2014
Firstpage
2084
Lastpage
2087
Abstract
FINFET devices have generated an alternative convincing next-generation foundation in IC industry. The outrageously leaky Ioff current gets controlled as the channel length is imperatively shortened down to 40nm and below. Somehow, the 3-dimensional fin structure makes itself distinct from the traditional MOSFET transistors, e.g., the threshold voltages (Vt). In some channel lengths, Vt may turn to be negative on NFINFET, while it may turn to be positive on PFINFET. It is intriguing to use or propose another reliable way to determine threshold voltages. In this study, a reliable and direct way is proposed using modeled current-voltage characteristic curves to fit measured ones. After fitting, some other physical quantities can be simultaneously determined giving persuasive understanding on the devices.
Keywords
MOSFET; leakage currents; silicon-on-insulator; 3D Fin structure; MOSFET transistors; N-channel Fin-FET devices; NFINFET; PFINFET; channel length; current-voltage characteristic curves; size 40 nm; threshold voltages; FinFETs; Fitting; Logic gates; Silicon-on-insulator; Temperature; Threshold voltage; 3-D Fin Structure; Fin-FET Devices; Leakage current; Over Etching; Over Exposure;
fLanguage
English
Publisher
ieee
Conference_Titel
Information Science, Electronics and Electrical Engineering (ISEEE), 2014 International Conference on
Conference_Location
Sapporo
Print_ISBN
978-1-4799-3196-5
Type
conf
DOI
10.1109/InfoSEEE.2014.6946291
Filename
6946291
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