• DocumentCode
    142266
  • Title

    The alternative algorithm for the determination of threshold voltages on N-channel Fin-FET devices

  • Author

    Hsin-Chia Yang ; Cheng-Yu Tsai ; Ko-Fan Liao ; Wen-Shang Liao ; Fang Hsu ; Sung-Ching Chi

  • Author_Institution
    Dept. of Electron. Eng., Minghsin Univ. of Sci. & Technol., Hsinchu, Taiwan
  • Volume
    3
  • fYear
    2014
  • fDate
    26-28 April 2014
  • Firstpage
    2084
  • Lastpage
    2087
  • Abstract
    FINFET devices have generated an alternative convincing next-generation foundation in IC industry. The outrageously leaky Ioff current gets controlled as the channel length is imperatively shortened down to 40nm and below. Somehow, the 3-dimensional fin structure makes itself distinct from the traditional MOSFET transistors, e.g., the threshold voltages (Vt). In some channel lengths, Vt may turn to be negative on NFINFET, while it may turn to be positive on PFINFET. It is intriguing to use or propose another reliable way to determine threshold voltages. In this study, a reliable and direct way is proposed using modeled current-voltage characteristic curves to fit measured ones. After fitting, some other physical quantities can be simultaneously determined giving persuasive understanding on the devices.
  • Keywords
    MOSFET; leakage currents; silicon-on-insulator; 3D Fin structure; MOSFET transistors; N-channel Fin-FET devices; NFINFET; PFINFET; channel length; current-voltage characteristic curves; size 40 nm; threshold voltages; FinFETs; Fitting; Logic gates; Silicon-on-insulator; Temperature; Threshold voltage; 3-D Fin Structure; Fin-FET Devices; Leakage current; Over Etching; Over Exposure;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Information Science, Electronics and Electrical Engineering (ISEEE), 2014 International Conference on
  • Conference_Location
    Sapporo
  • Print_ISBN
    978-1-4799-3196-5
  • Type

    conf

  • DOI
    10.1109/InfoSEEE.2014.6946291
  • Filename
    6946291