DocumentCode :
1422853
Title :
Fabrication of Complex Structures on Nonplanar Surfaces Through a Transfer Method
Author :
Zeng, Xuefeng ; Jiang, Hongrui
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Wisconsin-Madison, Madison, WI, USA
Volume :
20
Issue :
1
fYear :
2011
Firstpage :
6
Lastpage :
8
Abstract :
We report on a method to fabricate complex microelectromechanical systems (MEMS) structures onto a flexible membrane. Three-dimensional and high-aspect-ratio MEMS structures were formed on a silicon-on-insulator wafer by deep reactive-ion etching and then were partially buried in a flexible polymer membrane. After being released from the silicon substrate, the flexible membrane with the complex structures could deform to curvilinear shapes and then could be transferred onto curvilinear surfaces. The effect of the structure and density of the pillars on the transferring procedure is studied. Potentially, this method could be utilized to transfer any MEMS structures and devices to any nonplanar surfaces, thus possessing great potential in MEMS devices.
Keywords :
micromechanical devices; silicon; silicon-on-insulator; sputter etching; MEMS structure fabrication; SOI; Si; complex microelectromechanical systems; curvilinear shapes; curvilinear surfaces; deep reactive-ion etching; flexible polymer membrane; high-aspect-ratio MEMS structures; nonplanar surfaces; silicon-on-insulator wafer; transfer method; Fabrication; flexible substrate; high aspect ratio; nonplanar surface;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2010.2100034
Filename :
5685243
Link To Document :
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