DocumentCode :
1423272
Title :
New submicron HBT IC technology demonstrates ultra-fast, low-power integrated circuits
Author :
Hafizi, Madjid
Author_Institution :
Hughes Res. Labs., Malibu, CA, USA
Volume :
45
Issue :
9
fYear :
1998
fDate :
9/1/1998 12:00:00 AM
Firstpage :
1862
Lastpage :
1868
Abstract :
A new submicron HBT-based integrated circuit technology has been developed to fabricate transistors as small as 0.2 μm2 emitter geometry. Using this novel process approach we have been able to reduce our minimum device geometry by a factor of more than ten, and reduce the metallization pitch by a factor of two compared to our baseline process. At the same time, the device RF performance improved by a factor of two. Submicron heterojunction bipolar transistors (HBT´s) fabricated with this process exhibited fT and fmax values greater than 165 and 140 GHz, respectively, and dc current gain of over 50. We have also demonstrated several circuits using submicron HBT´s in this new IC technology. In particular, a latching comparator circuit which is a key building block of analog-to-digital converters, performed at 40 GHz. It exhibited three times the speed, one-third the dc power, and one-third the chip size of a similar circuit in our baseline process. A single-chip, PLL-based clock and data recovery circuit was fully functional at 4 GHz with a power supply voltage of 2.5 V. It consumed a total dc power of 50 mW, including input and output buffers
Keywords :
bipolar integrated circuits; heterojunction bipolar transistors; integrated circuit technology; DC current gain; PLL-based clock and data recovery circuit; RF performance; analog-to-digital converter; heterojunction bipolar transistor fabrication; latching comparator circuit; metallization; submicron HBT IC technology; ultra-fast low-power integrated circuit; Analog integrated circuits; Application specific integrated circuits; Bipolar integrated circuits; Digital integrated circuits; Geometry; Heterojunction bipolar transistors; Indium phosphide; Integrated circuit technology; Radio frequency; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.711348
Filename :
711348
Link To Document :
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