DocumentCode :
1423487
Title :
GaAs MODFET transconductance stability
Author :
Hanka, S.A. ; Chen, C.H. ; Vold, P. ; Akinwande, T.
Author_Institution :
Honeywell Syst. & Res. Center, Bloomington, MN, USA
Volume :
39
Issue :
5
fYear :
1990
fDate :
12/1/1990 12:00:00 AM
Firstpage :
571
Lastpage :
574
Abstract :
The thermal stability of GaAs modulation-doped field effect transistors (MODFETs) is evaluated in order to identify failure mechanisms and validate the reliability of these devices. The transistors were exposed to thermal step-stress and characterized at ambient temperatures to indicate device reliability, especially that of the transistor ohmic contacts with and without molybdenum diffusion barriers. The device without molybdenum exhibited important transconductance deterioration. MODFETs with molybdenum diffusion barriers were tolerant to temperatures above 300°C. This tolerance indicates that thermally activated failure mechanisms are slow at operational temperatures. Therefore, high-reliability MODFET-based circuits are possible
Keywords :
III-V semiconductors; failure analysis; gallium arsenide; high electron mobility transistors; reliability; stability; 300 degC; GaAs field effect transistors; MODFET; Mo diffusion barriers; ambient temperatures; failure mechanisms; modulation-doped field effect transistors; reliability; semiconductor; thermal step-stress; thermally activated failure mechanisms; transconductance stability; transistor ohmic contacts; Failure analysis; Gallium arsenide; HEMTs; MODFET circuits; Ohmic contacts; Stability; Temperature; Testing; Thermal stresses; Transconductance;
fLanguage :
English
Journal_Title :
Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9529
Type :
jour
DOI :
10.1109/24.61313
Filename :
61313
Link To Document :
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