DocumentCode :
1423974
Title :
Fatigue Insensitivity of Nanoscale Freestanding Aluminum Films
Author :
Kumar, Sandeep ; Alam, Md Tarekul ; Haque, M.A.
Author_Institution :
Mech. & Nucl. Eng. Dept., Pennsylvania State Univ., University Park, PA, USA
Volume :
20
Issue :
1
fYear :
2011
Firstpage :
53
Lastpage :
58
Abstract :
We demonstrate a microelectromechanical-system-based setup for fatigue studies on 200-nm-thick freestanding aluminum specimens in situ inside the transmission electron microscope. The specimens did not show any sign of fatigue damage even at 1.2 ×106 cycles under nominal stresses about 80% of the static ultimate strength. We show direct evidence to propose that the conventional theory of fatigue crack nucleation through slip bands does not work for nanoscale freestanding thin films, which gives rise to the anomalous fatigue insensitivity.
Keywords :
aluminium; fatigue cracks; micromechanical devices; thin films; transmission electron microscopes; anomalous fatigue insensitivity; fatigue crack nucleation; microelectromechanical-system-based setup; nanoscale freestanding aluminum films; nanoscale freestanding thin films; size 200 nm; slip bands; transmission electron microscope; Electron microscopy; fatigue; microelectromechanical devices; thin films;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2010.2100033
Filename :
5685789
Link To Document :
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