DocumentCode :
1424154
Title :
“Non-Hydrogen-Transport” Characteristics of Dynamic Negative-Bias Temperature Instability
Author :
Teo, Zhi Qiang ; Ang, Diing Shenp ; Ng, Chee Mang
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
Volume :
31
Issue :
4
fYear :
2010
fDate :
4/1/2010 12:00:00 AM
Firstpage :
269
Lastpage :
271
Abstract :
It has been proposed that negative-bias temperature instability (NBTI) is driven by interface-state generation, rate limited by hydrogen transport. In this letter, we examine dynamic NBTI characteristics and present evidence which does not conform to a hydrogen-transport model. It is observed that the amount of recovery of the threshold voltage shift |ΔVt| remains constant, independent of the number of stress/recovery (SR) cycles. This behavior is inconsistent with the hydrogen-transport model, which stipulates that the amount of |ΔVt| recovery should decrease with increase in the number of SR cycles. Results show that dynamic NBTI is made up of a symmetric "switching hole-trap" mechanism superimposed on a background of relatively permanent deep-level hole trap and interface-state generation.
Keywords :
deep levels; hole traps; hydrogen; interface states; switching; dynamic negative-bias temperature instability; hydrogen-transport model; interface-state generation; nonhydrogen-transport characteristics; permanent deep-level hole trap; stress-recovery cycles; symmetric switching hole-trap mechanism; threshold voltage shift; Dispersive transport; hole traps; interface traps; reaction–diffusion; ultrafast switching measurement;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2039848
Filename :
5419107
Link To Document :
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