DocumentCode
1424658
Title
Operational analysis of synchrotron-based x-ray lithography: Simulation model of wafer flows
Author
White, K. Preston, Jr. ; Trybula, Walter J.
Author_Institution
University of Virginia
Volume
23
Issue
4
fYear
2000
fDate
10/1/2000 12:00:00 AM
Firstpage
238
Lastpage
238
Keywords
Analytical models; Data mining; Databases; Discrete event simulation; Frequency estimation; Logic; Process design; Semiconductor device modeling; Synchrotron radiation; X-ray lithography;
fLanguage
English
Journal_Title
Electronics Packaging Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
1521-334X
Type
jour
DOI
10.1109/TEPM.2000.895065
Filename
895065
Link To Document