• DocumentCode
    1424658
  • Title

    Operational analysis of synchrotron-based x-ray lithography: Simulation model of wafer flows

  • Author

    White, K. Preston, Jr. ; Trybula, Walter J.

  • Author_Institution
    University of Virginia
  • Volume
    23
  • Issue
    4
  • fYear
    2000
  • fDate
    10/1/2000 12:00:00 AM
  • Firstpage
    238
  • Lastpage
    238
  • Keywords
    Analytical models; Data mining; Databases; Discrete event simulation; Frequency estimation; Logic; Process design; Semiconductor device modeling; Synchrotron radiation; X-ray lithography;
  • fLanguage
    English
  • Journal_Title
    Electronics Packaging Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1521-334X
  • Type

    jour

  • DOI
    10.1109/TEPM.2000.895065
  • Filename
    895065