DocumentCode :
1426009
Title :
Investigation on the Retention Reliability of Scaled  \\hbox {SiO}_{2}/\\hbox {Al}_{x}\\hbox {O}_{y}/\\hbox {SiO}_{2} Inter-Poly Dielectrics for nand Flash memory; High-$k$ dielectric; inter-poly dielectric (IPD); retention reliability;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2039985
Filename :
5419996
Link To Document :
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