مرکز منطقه ای اطلاع رساني علوم و فناوري - Highly accurate measurement of reflectivity and optical absorption in distributed Bragg reflectors using wafer fused resonator

DocumentCode :

1427428

Title :

Highly accurate measurement of reflectivity and optical absorption in distributed Bragg reflectors using wafer fused resonator

Author :

Berseth, C.-A. ; Syrbu, A.V. ; Lakovlev, V.P. ; Dehaese, O. ; Rudra, A. ; Kapon, E.

Author_Institution :

Inst. for Micro- and Optoelectron., Fed. Inst. of Technol., Lausanne, Switzerland

Volume :

Issue :

fYear :

1998

fDate :

8/20/1998 12:00:00 AM

Firstpage :

1666

Lastpage :

1667

Abstract :

A new experimental method for the accurate determination of optical absorption in distributed Bragg reflectors is demonstrated. It is based on the linewidth of the optical transmission through a symmetric resonator fabricated by wafer fusion of two samples of the same mirror. The optical absorption of a Zn-doped GaAs/Al₆₅Ga ₃₅As Bragg mirror is found to be 48±3cm^-1 at 1539 nm

Keywords :

distributed Bragg reflector lasers; 1539 nm; GaAs:Zn-Al₆₅Ga₃₅As; Zn-doped GaAs/Al₆₅Ga₃₅As Bragg mirror; distributed Bragg reflector; optical absorption measurement; optical transmission linewidth; reflectivity measurement; wafer fused resonator;

fLanguage :

English

Journal_Title :

Electronics Letters

Publisher :

iet

ISSN :

0013-5194

Type :

jour

DOI :

10.1049/el:19981148

Filename :

715281

Link To Document :

https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1427428