• DocumentCode
    1427949
  • Title

    High-speed low-parasitic low-divergence 635 nm singlemode lasers

  • Author

    Lu, BO ; Vail, E. ; Osinski, J.S. ; Schmitt, B.

  • Author_Institution
    SDL Inc., San Jose, CA, USA
  • Volume
    34
  • Issue
    18
  • fYear
    1998
  • fDate
    9/3/1998 12:00:00 AM
  • Firstpage
    1750
  • Lastpage
    1751
  • Abstract
    Low-parasitic ridge waveguide 635 nm low-divergence singlemode lasers have been fabricated with isolation etching though a quantum well region and p-contact lift-off process to reduce the junction capacitance. An electrical modulation speed of up to 2.7 GHz has been achieved at 20°C and of 1.4 GHz at 50°C
  • Keywords
    etching; laser modes; quantum well lasers; ridge waveguides; waveguide lasers; 1.4 GHz; 2.7 GHz; 20 degC; 50 degC; 635 nm; electrical modulation speed; isolation etching; junction capacitance; low-parasitic ridge waveguide; p-contact lift-off process; quantum well lasers; quantum well region; singlemode lasers;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19981211
  • Filename
    715365