• DocumentCode
    1428301
  • Title

    Gas mixture analysis using silicon micro-reactor systems

  • Author

    Becker, T. ; Mühlberger, S. ; Braunmühl, C. Bosch-v ; Müller, G. ; Meckes, A. ; Benecke, W.

  • Author_Institution
    Daimler Chrysler AG, Munich, Germany
  • Volume
    9
  • Issue
    4
  • fYear
    2000
  • Firstpage
    478
  • Lastpage
    484
  • Abstract
    A novel way of operating metal-oxide gas sensors is demonstrated that extends the gas-analyzing facilities of conventional thin-film gas sensors. In our approach, thin-film metal-oxide gas sensors on micro-machined heater substrates are embedded into tiny silicon micro-chambers to form micro-reactor devices. Analyzing samples of polluted air, such micro-reactors can be operated either in constant-flow or no-flow modes. Whereas in the first mode, essentially normal sensor behavior is observed, gas depletion reactions are observed in the latter. Such depletion reactions are shown to provide, in a straightforward way, analytical information about gas mixtures which is difficult to obtain under normal sensor operating conditions. As an application example, we demonstrate how a micro-reactor device can be used to analyze samples of polluted air for their O/sub 3/ and NO/sub 2/ contents.
  • Keywords
    elemental semiconductors; gas sensors; microfluidics; micromachining; microsensors; silicon; NO/sub 2/; O/sub 3/; Si; constant-flow modes; gas depletion reactions; gas mixture analysis; gas-analyzing facilities; metal-oxide gas sensors; micro-machined heater substrates; micro-reactor systems; no-flow modes; polluted air; sensor operating conditions; thin-film gas sensors; Air pollution; Gas detectors; Gases; Microsensors; Semiconductor thin films; Silicon; Sputtering; Substrates; Thin film devices; Thin film sensors;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/84.896769
  • Filename
    896769