Title :
Gas mixture analysis using silicon micro-reactor systems
Author :
Becker, T. ; Mühlberger, S. ; Braunmühl, C. Bosch-v ; Müller, G. ; Meckes, A. ; Benecke, W.
Author_Institution :
Daimler Chrysler AG, Munich, Germany
Abstract :
A novel way of operating metal-oxide gas sensors is demonstrated that extends the gas-analyzing facilities of conventional thin-film gas sensors. In our approach, thin-film metal-oxide gas sensors on micro-machined heater substrates are embedded into tiny silicon micro-chambers to form micro-reactor devices. Analyzing samples of polluted air, such micro-reactors can be operated either in constant-flow or no-flow modes. Whereas in the first mode, essentially normal sensor behavior is observed, gas depletion reactions are observed in the latter. Such depletion reactions are shown to provide, in a straightforward way, analytical information about gas mixtures which is difficult to obtain under normal sensor operating conditions. As an application example, we demonstrate how a micro-reactor device can be used to analyze samples of polluted air for their O/sub 3/ and NO/sub 2/ contents.
Keywords :
elemental semiconductors; gas sensors; microfluidics; micromachining; microsensors; silicon; NO/sub 2/; O/sub 3/; Si; constant-flow modes; gas depletion reactions; gas mixture analysis; gas-analyzing facilities; metal-oxide gas sensors; micro-machined heater substrates; micro-reactor systems; no-flow modes; polluted air; sensor operating conditions; thin-film gas sensors; Air pollution; Gas detectors; Gases; Microsensors; Semiconductor thin films; Silicon; Sputtering; Substrates; Thin film devices; Thin film sensors;
Journal_Title :
Microelectromechanical Systems, Journal of