Multi-walled microchannels: free-standing porous silicon membranes for use in /spl mu/TAS

Electrochemically formed porous silicon (PS) can be released from the bulk silicon substrate by underetching at increased current density. Using this technique, two types of channels containing free-standing layers of PS were constructed, which were failed multi-walled microchannels (MW /spl mu/Cs). They can be used in devices like microsieves, microbatteries, and porous electrodes. Two types of MW/spl mu/C were made: the "conventional" version, consisting of two or more coaxially constructed microchannels separated by a suspended PS membrane, and the buried variety, where a PS membrane is suspended halfway in an etched cavity surrounded by silicon nitride walls. The latter is more robust. The pore size of the PS was measured using transmission electron microscopy and field emission gun scanning electron microscopy (FEGSEM) and found to be of the order of 7 nm.