DocumentCode
1428811
Title
Optimization of Current Injection Area for Low-Threshold Operation of 3-D Lasers
Author
Maslov, Alexey V. ; Miyawaki, Mamoru
Author_Institution
Opt. Res. Lab., Canon U.S.A., Inc., Tucson, AZ, USA
Volume
47
Issue
2
fYear
2011
Firstpage
238
Lastpage
244
Abstract
We analyze the reduction of threshold current by optimizing the area of the active layer into which the carriers are injected. The optimal area is shown to depend on the size of the optical mode, cavity lifetime, and the optical properties of the active layer. We introduce a critical value for the cavity lifetime that depends only on the properties of the active layer and show how the optimal area can be estimated depending on the cavity lifetime with respect to its critical value. For optimization, two cases are considered, with and without optical absorption in the active layer outside of the injection area. The active layer is modeled as a double heterostructure with parameters relevant to nitride semiconductors and the optical mode is taken as for a micrometer-size cavity.
Keywords
laser modes; light absorption; microcavities; microcavity lasers; semiconductor device models; semiconductor lasers; surface emitting lasers; 3D lasers; VCSEL; active layer; cavity lifetime; current injection area optimization; double heterostructure; low-threshold operation; micrometer-size cavity; nitride semiconductors; optical absorption; optical mode; optical properties; threshold current; Absorption; Cavity resonators; Current density; Mathematical model; Photonics; Threshold current; Vertical cavity surface emitting lasers; Semiconductor device modeling; semiconductor lasers;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.2010.2072774
Filename
5689377
Link To Document