DocumentCode :
1428864
Title :
A Novel Method of MOSFET Series Resistance Extraction Featuring Constant Mobility Criteria and Mobility Universality
Author :
Lin, Da-Wen ; Cheng, Ming-Lung ; Wang, Shyh-Wei ; Wu, Chung-Cheng ; Chen, Ming-Jer
Author_Institution :
Semicond. Manuf. Co., Hsinchu, Taiwan
Volume :
57
Issue :
4
fYear :
2010
fDate :
4/1/2010 12:00:00 AM
Firstpage :
890
Lastpage :
897
Abstract :
A method of MOSFET series resistance extraction is established in this paper. The core of this method relies on the constant mobility criteria, while for different gate lengths, it preserves the shape of universal mobility curves in the high-vertical-field regime. Consequently, the series resistance of a MOSFET can be extracted in an analytical and self-consistent manner, achieved without the knowledge of the gate oxide thickness, channel length, channel doping, or channel stress. Reasonable values of extracted series resistance are demonstrated in a wide range of gate length. Technology computer-aided design simulation further corroborates the validity of the proposed method, particularly for devices with heavily doped source/drain extensions. The constant mobility criteria with respect to the bulk charge linearization coefficient are also verified.
Keywords :
MOSFET; circuit CAD; MOSFET series resistance extraction; channel stress; charge linearization coefficient; computer-aided design simulation; constant mobility criteria; gate oxide thickness; high-vertical-field regime; mobility universality; universal mobility curves; Computational modeling; Degradation; Design automation; Doping; Length measurement; MOSFET circuits; Semiconductor device manufacture; Shape; Stress; Voltage; MOSFET; series resistance; universal mobility;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2041508
Filename :
5422666
Link To Document :
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