DocumentCode :
1429754
Title :
Through-Silicon Vias Filled With Densified and Transferred Carbon Nanotube Forests
Author :
Wang, Teng ; Chen, Si ; Jiang, Di ; Fu, Yifeng ; Jeppson, Kjell ; Ye, Lilei ; Liu, Johan
Author_Institution :
Dept. of Microtechnol. & Nanosci. (MC2), Chalmers Univ. of Technol., Goteborg, Sweden
Volume :
33
Issue :
3
fYear :
2012
fDate :
3/1/2012 12:00:00 AM
Firstpage :
420
Lastpage :
422
Abstract :
Through-silicon vias (TSVs) filled with densified and transferred carbon nanotube (CNT) forests are experimentally demonstrated. The filling is achieved by a postgrowth low-temperature transfer process at 200 instead of direct CNT growth in the vias normally requiring high temperature. A vapor densification method is also applied to densify the as-grown CNT forests, which allows for packing more CNTs in the vias to reduce their resistances. CNT-filled TSVs fabricated based on these two key steps show CMOS compatibility and roughly one order of magnitude reduction in resistivity compared to the TSVs filled with as-grown undensified CNT forests.
Keywords :
CMOS integrated circuits; carbon nanotubes; integrated circuit packaging; semiconductor growth; three-dimensional integrated circuits; C; CMOS compatibility; CNT packaging; TSV; as-grown undensified CNT forest; densified CNT forest; densified carbon nanotube forest; direct CNT forest growth; magnitude reduction; postgrowth low-temperature transfer process; through-silicon vias; transferred CNT forest; transferred carbon nanotube forest; vapor densification method; Carbon nanotubes; Fabrication; Plasma temperature; Scanning electron microscopy; Silicon; System-on-a-chip; Through-silicon vias; Carbon nanotubes (CNTs); densification; interconnects; through-silicon vias (TSVs); transfer;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2177804
Filename :
6138280
Link To Document :
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