DocumentCode :
1430375
Title :
Local Control System of the Elliptically Polarized Undulator at SSRF
Author :
Zhang, J. ; Zhou, Q. ; Zhuo, J.
Author_Institution :
Shanghai Inst. of Appl. Phys., C.A.S., Shanghai, China
Volume :
20
Issue :
3
fYear :
2010
fDate :
6/1/2010 12:00:00 AM
Firstpage :
332
Lastpage :
335
Abstract :
The Shanghai Synchrotron Radiation Facility (SSRF) is a third-generation light source with major emphasis on insertion device (ID) sources. In the storage ring there are 20 straight sections, each about six or ten meters in length, for possible insertion devices. Currently there installed three undulators and two wiggler installed in five straight sections. They were originally designed and fabricated by the Shanghai Institute of Applied Physics (SINAP). A variable polarizing undulator was constructed as the light source of the soft X-rays beamline for SSRF. This local control system consists of a Siemens PLC and a six axis Masterdrive motion controller. Four servo motors control the gap - two on the upper girder and two on the lower girder, and another two servos controls the phase - one on the upper girder outer and one on the lower girder inner. The main control system at the SSRF is experimental physics and industrial control system (EPICS). This paper will discuss in detail the design philosophy and the implementation of the Six-motor insertion device control system. This control system has been in operation for about one year.
Keywords :
light sources; motion control; physical instrumentation control; programmable controllers; servomotors; synchrotron radiation; wigglers; SSRF; Shanghai Institute of Applied Physics; Shanghai synchrotron radiation facility; Siemens PLC; elliptically polarized undulator; experimental physics; industrial control system; local control system; masterdrive motion controller; servo motors; six-motor insertion device control system; soft X-rays beamline; variable polarizing undulator; Control instrumentation; EPU; PLC; insertion device; undulator;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/TASC.2010.2040952
Filename :
5422919
Link To Document :
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