Full-wafer technology-A new approach to large-scale laser fabrication and integration

Author

Vettiger, Peter ; Benedict, Melvin K. ; Bona, Gian-Luca ; Buchmann, Peter ; Cahoon, Edward C. ; Datwyler, Kurt ; Dietrich, Hans-Peter ; Moser, Andreas ; Seitz, Hugo K. ; Voegeli, Otto ; Webb, David J. ; Wolf, Peter

Author_Institution

IBM Zurich Res. Lab., Ruschlikon, Switzerland

Volume

27

Issue

6

fYear

1991

fDate

6/1/1991 12:00:00 AM

Firstpage

1319

Lastpage

1331

Abstract

A concept for full-wafer processing (FWP) and full-wafer testing (FWT) for semiconductor laser fabrication in the AlGaAs-GaAs material system is presented. The approach is based on chemically assisted ion beam etching for the laser-mirror formation. Record values for mirror scattering, optimum mirror reflectivity, and equivalence to cleaved mirrors in terms of laser threshold and efficiency have been achieved. Promising results for uniformity and reproducibility for major laser diode characteristics on processed 2-in wafers have been found. The FWP technology has been extensively used for designing test sites to determine various materials, process, and laser parameters, such as sheet resistance, ridge dimensions, lithographic alignment errors, mirror surface leakage, etc

Keywords

III-V semiconductors; aluminium compounds; gallium arsenide; integrated circuit technology; integrated optoelectronics; large scale integration; semiconductor junction lasers; sputter etching; AlGaAs-GaAs; AlGaAs-GaAs material system; III-V semiconductors; chemically assisted ion beam etching; cleaved mirrors; efficiency; full-wafer processing; full-wafer testing; integration; large-scale laser fabrication; laser diode characteristics; laser threshold; laser-mirror formation; lithographic alignment errors; mirror scattering; mirror surface leakage; optimum mirror reflectivity; ridge dimensions; semiconductor laser fabrication; sheet resistance; Chemical lasers; Chemical technology; Large-scale systems; Materials testing; Mirrors; Optical materials; Semiconductor device testing; Semiconductor lasers; Surface resistance; System testing;

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/3.89949

Filename

89949