DocumentCode :
1432290
Title :
Low-frequency noise characterization of latent damage in thin oxides subjected to high-field impulse stressing
Author :
Chim, W.K. ; Yeo, B.P. ; Lim, P.S. ; Chan, D.S.H.
Author_Institution :
Fac. of Eng., Nat. Univ. of Singapore, Singapore
Volume :
19
Issue :
10
fYear :
1998
Firstpage :
363
Lastpage :
366
Abstract :
Latent damage in thin oxides, caused by high-field impulse stressing, can lead to increased trap generation in the device during the subsequent hot-carrier stressing. Monitoring of such damage is typically carried out by detecting the change in an appropriate electrical parameter of the device or by extracting the generated interface states and trapped charges. It was found that low-frequency noise measurements could provide a more sensitive alternative for characterizing the electrostatic discharge stress-induced latent damage in thin oxides.
Keywords :
MOSFET; electron traps; electrostatic discharge; high field effects; hot carriers; interface states; semiconductor device noise; MOSFET; electrical parameter; electrostatic discharge; high field impulse stressing; hot carrier stressing; interface states; latent damage; low frequency noise; thin oxide; trap generation; 1f noise; Breakdown voltage; Condition monitoring; Electrostatic discharge; Hot carriers; Low-frequency noise; MOSFET circuits; Noise measurement; Protection; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.720187
Filename :
720187
Link To Document :
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