DocumentCode
1432778
Title
Multiwavelength light emitters for scanning applications fabricated by flipchip bonding
Author
Hofstetter, D. ; Sun, D. ; Dunnrowicz, C. ; Kneissl, M. ; Treat, D.W.
Author_Institution
Xerox Palo Alto Res. Center, CA, USA
Volume
10
Issue
10
fYear
1998
Firstpage
1371
Lastpage
1373
Abstract
We present a multiwavelength light source which was fabricated using a self-aligned flipchip bonding technique. The device consists of an InGaN-GaN light-emitting diode emitting light at around 420 nm, on top of which we flipchip-bonded a monolithically integrated red/infrared dual-beam laser. The upper two lasers were built by selective removal of the red laser, and subsequent regrowth of an infrared laser structure. Since all processes, including the deposition of the PbSn solder bumps for bonding, were based on photolithographic precision, tight alignment tolerances of /spl plusmn/μm in the lateral direction could be fulfilled between the ridge waveguides of the three light emitters. For a high-speed color scanning system, this is an important design criterion because it will allow the use of a single scanning optics for the three laser beams.
Keywords
III-V semiconductors; flip-chip devices; gallium compounds; indium compounds; integrated circuit technology; integrated optoelectronics; light emitting diodes; light sources; optical fabrication; optical scanners; photolithography; semiconductor lasers; semiconductor technology; 420 nm; InGaN-GaN; InGaN-GaN light-emitting diode; PbSn; PbSn solder bumps; emitting light; flipchip bonding; flipchip-bonded; high-speed color scanning system; infrared laser structure; laser beams; lateral direction; monolithically integrated red/infrared dual-beam laser; multiwavelength light emitters; multiwavelength light source; photolithographic precision; ridge waveguides; scanning applications; self-aligned flipchip bonding technique; single scanning optics; subsequent regrowth; tight alignment tolerances; Bonding; Chemical lasers; Laser beams; Light emitting diodes; Light sources; Monolithic integrated circuits; Optical device fabrication; Optical waveguides; Waveguide lasers; Wet etching;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.720264
Filename
720264
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