Title :
PECVD grown multiple core planar waveguides with extremely low interface reflections and losses
Author :
Laurent-Lund, Christian ; Poulsen, Mogens Rysholt ; Beukema, Martijn ; Pedersen, Jens Engholm
Author_Institution :
Mikroelektronik Center, Tech. Univ., Lyngby, Denmark
Abstract :
A novel and generic method for fabricating silica-on-silicon planar lightwave circuits with cores composed of two or more different types of glasses is described. The basic process technologies used are silane/germane/nitrous-oxide based plasma enhanced chemical vapor deposition and fluorine based reactive ion etching. Very high-quality interfaces between the different core glasses are obtained with interface losses as low as 0.022/spl plusmn/0.012 dB and reflection levels below -80 dB. This technique adds flexibility and ease to the design of complex silica planar waveguide components, allowing, e.g., independent optimization of amplifying and passive sections in lossless devices based on erbium-doped planar waveguides.
Keywords :
erbium; integrated optoelectronics; optical fabrication; optical losses; optical planar waveguides; plasma CVD; reflectivity; semiconductor growth; vapour phase epitaxial growth; 0.022 dB; PECVD grown multiple core planar waveguides; amplifying sections; complex silica planar waveguide components; erbium-doped planar waveguides; extremely low interface reflections; fluorine based reactive ion etching; high-quality interfaces; independent optimization; interface losses; low optical losses; passive sections; process technologies; reflection levels; silane/germane/nitrous-oxide based plasma enhanced chemical vapor deposition; silica-on-silicon planar lightwave circuits; solid lasers; Chemical technology; Chemical vapor deposition; Circuits; Etching; Glass; Planar waveguides; Plasma applications; Plasma chemistry; Plasma waves; Waveguide components;
Journal_Title :
Photonics Technology Letters, IEEE
