DocumentCode :
1433387
Title :
Fast and Accurate Analytical Modeling of Through-Silicon-Via Capacitive Coupling
Author :
Kim, Dae Hyun ; Mukhopadhyay, Saibal ; Lim, Sung Kyu
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Volume :
1
Issue :
2
fYear :
2011
Firstpage :
168
Lastpage :
180
Abstract :
In this paper, we present analytical models for fast estimation of coupling capacitance of square-shaped through-silicon vias (TSVs) in three-dimensional integrated circuits (3D ICs). Errors between our model and Synopsys Raphael simulation on regular TSV structures remain less than 6.03% while the computation time of our model for capacitance estimation is negligible. We also develop a simple capacitance estimation technique to extract TSV-to-TSV coupling capacitance in general layouts. Average errors between our model and Raphael simulation on random TSV structures is 5.06%-8.24%, and maximum errors remain less than 18.91% which is tolerable for fast capacitance estimation in computer-aided design area.
Keywords :
capacitance; elemental semiconductors; silicon; three-dimensional integrated circuits; 3D IC; Si; TSV; analytical modeling; capacitance estimation technique; computer-aided design area; squared-shaped through-silicon-via capacitive coupling; synopsys Raphael simulation; three-dimensional integrated circuit; Capacitance; three-dimensional integrated circuits (3D IC); through-silicon via (TSV); timing analysis;
fLanguage :
English
Journal_Title :
Components, Packaging and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
2156-3950
Type :
jour
DOI :
10.1109/TCPMT.2010.2101910
Filename :
5699376
Link To Document :
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