DocumentCode :
1433532
Title :
Control of NOx by positive and negative pulsed corona discharges
Author :
Masuda, Senichi ; Nakao, Hideyuki
Author_Institution :
Dept. of Electr. Eng., Tokyo Univ., Bunkyo, Japan
Volume :
26
Issue :
2
fYear :
1990
Firstpage :
374
Lastpage :
383
Abstract :
The pulse-induced plasma chemical process (PPCP) is a novel means of processing with great potential in various applications including the removal of NO, SO2, HCl, and Hg vapor and other gaseous pollutants from combustion gases, the composition of gaseous and solid substances, the production of ultrafine particulate materials, the treatment of surfaces, etc. An investigation of the DENOX and DESOX of combustion gas by PPCP was conducted, confirming that DENOX is possible by both positive and negative pulsings and DESOX only by positive pulsing. NO is oxidized by PPCP to NO2, which is removed again by PPCP. The reaction speed for PPCP with positive pulsing is more than one order of magnitude higher than that with negative pulsing applicable to electrostatic precipitators. The reaction speed is greatly enhanced by raising the peak field intensity, which requires the use of a very sharp pulses. The speed is also enhanced by raising pulse frequency, lowering the gas temperature, and using sharp corona wires. The oxidation of NO and removal of NO2 can proceed without O 2 and moisture, but is greatly enhanced by them. The addition of NH3 also enhances NO2 removal, possibly by its NO2-scavenging effect from the gas phase, while it does not enhance NO oxidation. The combination of PPCP with the electron-beam DENOX and DESOX does not produce a nonlinear enhancing effect beyond the independent effect of PPCP alone
Keywords :
air pollution detection and control; corona; discharges (electric); flue gas desulphurisation; nitrogen compounds; sulphur compounds; DENOX; DESOX; FGD; HCl; Hg; NOx; SOx; air pollution control; combustion gases; gaseous pollutants; negative pulsings; peak field intensity; positive pulsing; pulse frequency; pulse-induced plasma chemical process; pulsed corona discharges; reaction speed; Chemical processes; Combustion; Gases; Mercury (metals); Oxidation; Plasma applications; Plasma chemistry; Plasma materials processing; Pollution; Solids;
fLanguage :
English
Journal_Title :
Industry Applications, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-9994
Type :
jour
DOI :
10.1109/28.54266
Filename :
54266
Link To Document :
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