DocumentCode :
1433888
Title :
Destruction of volatile organic compounds used in a semiconductor industry by a capillary tube discharge reactor
Author :
Kohno, Hitoshi ; Berezin, Alexander A. ; Chang, Jen-Shih ; Tamura, Minoru ; Yamamoto, Toshiaki ; Shibuya, Akira ; Honda, Shigeo
Author_Institution :
Res. & Dev. Center, Asahikogyosha Co. Ltd., Chiba, Japan
Volume :
34
Issue :
5
fYear :
1998
Firstpage :
953
Lastpage :
966
Abstract :
Nonthermal plasma technologies offer an innovative approach to the problem of decomposing various volatile organic compounds (VOCs). The authors focused on DC capillary tube discharge plasma reactors to study the decomposition/destruction efficiency for toluene, EGM, trichloroethane and trichloroethylene at 50-2300 ppm levels in dry air. The effects of gas flow rate, VOC concentration and reactor operating conditions on decomposition and analysis of reactant conversion for each VOC were investigated. The results show that VOC destruction efficiency as high as 90% can be achieved, even under a short residence time (3.8 ms) with a destruction energy efficiency of up to 95 g (VOC)/kWh. Laboratory-scale plasma technology was successfully demonstrated for its potential application for VOC control in the semiconductor clean-room environment
Keywords :
aerosols; clean rooms; corona; organic compounds; plasma applications; semiconductor device manufacture; 3.8 ms; 90 percent; DC capillary tube discharge plasma reactors; EGM; VOC concentration; application; capillary tube discharge reactor; destruction efficiency; energy efficiency; gas flow rate; laboratory-scale plasma technology; nonthermal plasma technologies; reactor operating conditions; residence time; semiconductor clean rooms; semiconductor industry; toluene; trichloroethane; trichloroethylene; volatile organic compounds destruction; Chemical technology; Electron tubes; Electronics industry; Gases; Inductors; Oxidation; Plasma applications; Plasma chemistry; Power engineering and energy; Volatile organic compounds;
fLanguage :
English
Journal_Title :
Industry Applications, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-9994
Type :
jour
DOI :
10.1109/28.720435
Filename :
720435
Link To Document :
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