• DocumentCode
    1434066
  • Title

    Magnetic Field Diffusion and Enhanced Resistivity in 12-cm-Diameter 200-ns 3.5-MA Z -Pinch Implosions

  • Author

    Qi, Niansheng ; Failor, B.H. ; Levine, J.S. ; Goyer, J. ; Sze, H. ; Verma, A.

  • Author_Institution
    Pulse Sci. Div., L-3 Commun., San Leandro, CA, USA
  • Volume
    38
  • Issue
    4
  • fYear
    2010
  • fDate
    4/1/2010 12:00:00 AM
  • Firstpage
    545
  • Lastpage
    553
  • Abstract
    Investigations of magnetic field diffusion and plasma resistivity in 12-cm-diameter triple-gas-puff Ar Z-pinch implosions were carried out by using planar laser-induced fluorescence (PLIF), a laser shearing interferometer (LSI), and a laser wavefront analyzer (LWA) on a 3.5-MA 200-ns generator. The PLIF measurements gave the initial Ar gas distributions. The implosion velocity and electron density profiles were measured from LWA and/or LSI. From these, the implosion plasma sheath thickness, ion density, mean ion charge states, temperatures, and implosion velocity are obtained, which allows us to calculate the classical plasma resistivity. A 1-D analytic magnetic field diffusion model is constructed and used to predict the imploding plasma sheath thickness and its resistivity. Based on comparisons of the experimental measurements and the diffusion model prediction, we found out that plasma resistivity is enhanced by the cross-field diffusion above the classical value, as high as 60 times the Spitzer´s value. Details are given in this paper.
  • Keywords
    Z pinch; argon; explosions; plasma X-ray sources; plasma density; plasma diagnostics; plasma sheaths; plasma temperature; plasma transport processes; 1D analytic magnetic field diffusion; Ar; Spitzer value; Z-pinch implosions; current 3.5 MA; electron density profiles; implosion velocity; ion density; laser shearing interferometer; laser wavefront analyzer; mean ion charge states; planar laser-induced fluorescence; plasma resistivity; plasma sheath thickness; size 12 cm; time 200 ns; Conductivity; fluorescence; interferometry; plasma pinch; plasma sheaths;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2010.2041939
  • Filename
    5427026