DocumentCode
1434169
Title
The time evolution of interdiffusion in multiple quantum wells: a new model of impurity-induced compositional intermixing
Author
Gass, Richard G. ; Jackson, Howard E.
Author_Institution
Dept. of Phys., Cincinnati Univ., OH, USA
Volume
4
Issue
4
fYear
1998
Firstpage
669
Lastpage
674
Abstract
A new model for impurity-induced compositional interdiffusion which depends explicitly on the time evolution of the impurity-induced vacancy spatial profile is explored. The inclusion of a new phenomenological term depending on the time derivative of the vacancy spatial profile provides a time scale, as well as a depth profile of the resulting interdiffusion. Calculations are presented as a function of time for a variety of vacancy concentrations and contrasted to the calculations using the model of Kahen, Rajeswaren, and Lee. Our model generates good agreement with a range of experiments including Si-focused ion beam implantation experiments in AlGaAs multiple quantum wells
Keywords
III-V semiconductors; aluminium compounds; chemical interdiffusion; focused ion beam technology; gallium arsenide; impurities; ion implantation; semiconductor device models; semiconductor quantum wells; AlGaAs; AlGaAs multiple quantum wells; Si; Si-focused ion beam implantation experiments; depth profile; impurity-induced compositional intermixing; impurity-induced vacancy spatial profile; interdiffusion; multiple quantum wells; phenomenological term; time derivative; time evolution; vacancy concentrations; vacancy spatial profile; Ion beams; Laser modes; Nanostructures; Optical device fabrication; Optical devices; Optical mixing; Optical refraction; Optical waveguides; Particle beam optics; Quantum well devices;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/2944.720478
Filename
720478
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