DocumentCode :
1434209
Title :
Interdiffused quantum wells for lateral carrier confinement in VCSELs
Author :
Naone, Ryan L. ; Floyd, Philip D. ; Young, D. Bruce ; Hegblom, Eric R. ; Strand, Timothy A. ; Coldren, Larry A.
Author_Institution :
Dept. of Mater., California Univ., Santa Barbara, CA, USA
Volume :
4
Issue :
4
fYear :
1998
Firstpage :
706
Lastpage :
714
Abstract :
We show that it is necessary to eliminate carrier diffusion in the active region for viable vertical-cavity lasers (VCLs) with small dimensions. However, methods that work well in reducing lateral carrier leakage in narrow ridge-waveguide lasers such as silicon induced disordering may be problematic in VCL structures. Encouraging results from novel methods for impurity free intermixing for VCL applications are presented
Keywords :
chemical interdiffusion; diffusion; laser cavity resonators; quantum well lasers; ridge waveguides; surface emitting lasers; waveguide lasers; VCL structures; VCSELs; active region; carrier diffusion; impurity free intermixing; interdiffused quantum wells; lateral carrier confinement; lateral carrier leakage; narrow ridge-waveguide lasers; silicon induced disordering; small dimensions; vertical-cavity lasers; Apertures; Carrier confinement; Laser modes; Optical losses; Optical scattering; Quantum well lasers; Semiconductor lasers; Surface emitting lasers; Threshold current; Vertical cavity surface emitting lasers;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/2944.720483
Filename :
720483
Link To Document :
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