DocumentCode :
1435128
Title :
Analytical Model of Undoped Polycrystalline Silicon Thin-Film Transistors Consistent With Pao-Sah Model
Author :
He, Hongyu ; Zheng, Xueren
Author_Institution :
Sch. of Electron. & Inf. Eng., South China Univ. of Technol., Guangzhou, China
Volume :
58
Issue :
4
fYear :
2011
fDate :
4/1/2011 12:00:00 AM
Firstpage :
1102
Lastpage :
1107
Abstract :
A physical-based analytical direct current model is developed for undoped polycrystalline silicon thin-film transistors including both subthreshold and above-threshold regimes by assuming an exponential density of trap states. Based on the charge sheet method, diffusion and drift currents are calculated in the subthreshold regime. The parameter is introduced to describe the increase in trapped charge with increasing gate voltage in the above-threshold regime, and a new simple drain current expression is presented. The proposed model is compared with the Pao-Sah model and verified with the experimental data. A good agreement is obtained.
Keywords :
elemental semiconductors; silicon; thin film transistors; Pao-Sah model; Si; above-threshold regime; charge sheet method; diffusion currents; drift currents; exponential density; physical-based analytical direct current model; subthreshold regimes; trap states; undoped polycrystalline thin-film transistors consistent; Analytical model; polycrystalline silicon (poly-Si); thin-film transistors (TFTs); transfer characteristics; trap states;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2103380
Filename :
5701661
Link To Document :
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