Title :
Measurement of the surface resistance of a metallic thin film at a wavelength of 10.6 μm
Author_Institution :
Dept. of Electr. Eng., Nat. Defense Acad., Yokosuka, Japan
fDate :
4/1/1990 12:00:00 AM
Abstract :
A quasi-optical method for measuring the surface resistance of a metallic thin film is described. This resistance is derived from measurements of the forward tilt of a surface wave which propagates on the thin metallic film. In order to verify the results, ellipsometry is used. The measurements were made at a wavelength of 10.6 μm at ambient temperature. The surface resistance of an Au film was measured to be 16 times higher than the classical surface resistance
Keywords :
electric resistance measurement; ellipsometry; gold; metallic thin films; surface conductivity; 10.6 micron; Au film; electric resistance measurement; ellipsometry; forward tilt; metallic thin film; quasi-optical method; submillimeter wave region; surface resistance; surface wave; Electrical resistance measurement; Gold; Microwave frequencies; Optical films; Surface resistance; Surface waves; Temperature; Transistors; Transmission line measurements; Wavelength measurement;
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
