DocumentCode :
1437006
Title :
Modeling and measurement of monomer pressure evolution in an inductively coupled pulsed plasma reactor for thin polymer films
Author :
Shepsis, Leo V. ; Pedrow, Patrick D. ; Mahalingam, R. ; Osman, Mohamed A.
Author_Institution :
Dept. of Chem. Eng., Washington State Univ., Pullman, WA, USA
Volume :
28
Issue :
6
fYear :
2000
fDate :
12/1/2000 12:00:00 AM
Firstpage :
2172
Lastpage :
2178
Abstract :
A model has been developed to predict the evolution of monomer pressure over time in an inductively coupled plasma reactor. The model uses an analogous electrical circuit to predict preplasma gas flow conditions. Based on the monomer pressure model, a relationship between pressure prior to electrical discharge and the corresponding plasma polymerized acetylene deposition rate was measured experimentally. A plot of measured deposition rate versus preplasma monomer pressure was observed to have a relative maximum
Keywords :
plasma chemistry; plasma materials processing; polymer films; polymerisation; analogous electrical circuit; electrical discharge; inductively coupled pulsed plasma reactor; monomer pressure evolution; monomer pressure model; plasma polymerized acetylene deposition rate; preplasma gas flow conditions; thin polymer films; Chemical engineering; Inductors; Plasma applications; Plasma measurements; Plasma properties; Polymer films; Powders; Predictive models; Pressure measurement; Pulse measurements;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.902244
Filename :
902244
Link To Document :
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